Thanks to the organization of the EuMW Steering Team, the special session on-wafer forum took place at EuMW 2024 in Paris. The topic focuses on transistor characterization with speakers from FBH and IMS Bordeaux. Challenges in characterization of InP HBTs and BiCMOS SiGe HBT technologies for figure of merits evaluation and compact modeling were presented and discussed. The forum was well attended with 25 participants from industry, metrology, and academia.

The subsequent discussions delved into specific technical challenges, including the precision of on-wafer measurement techniques and the accuracy of compact models. Participants exchanged insights on improving calibration strategies and measurement setups to address issues such as unwanted coupling and other parasitic effects. These focused discussions fostered a deeper understanding of the technical hurdles and facilitated productive knowledge exchange between researchers and industry professionals, laying the groundwork for potential collaborative efforts to advance transistor characterization.